EGK-3M

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Electron beam evaporation source EGK-3M is designed to improve performance and reliability based on ULVAC's many years of technical experience and achievements.
This evaporation source has a four-point switching hearth with a maximum input power of 5kW.
EGK-3M has four crucibles with a capacity of 2.9 cc, which enables the arbitary multilayer deposition.

Features

Any multi-layer film deposition is possible by adopting a 4-point switchable hearth with a crucible capacity of 2.9 cc.
The electron beam is deflected 225°, so it is not exposed to the vapor from the vaporized material and the filament has a long life.
Since the electron beam is deflected by the electromagnetic field, the influence of secondary electrons on the deposition target is extremely small.
By scanning the beam spot in the X-axis and Y-axis directions even with a sublimable substance, the partial digging phenomenon can be eliminated and the entire crucible can be evaporated smoothly.
Since the emitter assembly can be easily attached and detached, it is easy to replace consumable parts such as filaments and insulators.

Specifications

Acceleration voltage		-4kV～-10kV
Beam current		0.5A MAX
Maximum input power		5kW（-10kV／0.5A）
X axis magnet coil		-0.4A～-3.5A／-18V DC MAX About 2.2Ω（20℃）
Filament		0～12V AC
		0～40A max
Crucible	Quantity	4
	Volume	2.9cc
	Size	21Φ×17.5Φ×10H
Beam deflection angle		225°
Effective evaporation angle		90°or more
Deposition rate		0.6μm/min or more Aluminum 5kW、At 250H directly above Hearth
Cooling water amount	Hearth	8L/min or more 0.7MPa（maximum pressure）
	Coil	1 L/min or more 0.7 MPa (maximum pressure)
Water temperature		15～25℃
External dimensions		140W×126H×207D
Weight		About 5kg
Applicable power supply		HPS-510S, HPS-1000N
Remarks		Cooling water with a specific resistance of 5kΩ・cm or higher is recommended
Y-axis magnet coil (optional)		0～±1.2A／±12VDVmax About 1.7Ω（20℃）

該非判定結果報告書 Download

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Instruction Manuals and Specifications Download

Applications Download

Technical drawings Download

Technical Data Download

Features

Any multi-layer film deposition is possible by adopting a 4-point switchable hearth with a crucible capacity of 2.9 cc.

The electron beam is deflected 225°, so it is not exposed to the vapor from the vaporized material and the filament has a long life.

Since the electron beam is deflected by the electromagnetic field, the influence of secondary electrons on the deposition target is extremely small.

By scanning the beam spot in the X-axis and Y-axis directions even with a sublimable substance, the partial digging phenomenon can be eliminated and the entire crucible can be evaporated smoothly.

Since the emitter assembly can be easily attached and detached, it is easy to replace consumable parts such as filaments and insulators.

Specifications

Acceleration voltage		-4kV～-10kV
Beam current		0.5A MAX
Maximum input power		5kW（-10kV／0.5A）
X axis magnet coil		-0.4A～-3.5A／-18V DC MAX About 2.2Ω（20℃）
Filament		0～12V AC
		0～40A max
Crucible	Quantity	4
	Volume	2.9cc
	Size	21Φ×17.5Φ×10H
Beam deflection angle		225°
Effective evaporation angle		90°or more
Deposition rate		0.6μm/min or more Aluminum 5kW、At 250H directly above Hearth
Cooling water amount	Hearth	8L/min or more 0.7MPa（maximum pressure）
	Coil	1 L/min or more 0.7 MPa (maximum pressure)
Water temperature		15～25℃
External dimensions		140W×126H×207D
Weight		About 5kg
Applicable power supply		HPS-510S, HPS-1000N
Remarks		Cooling water with a specific resistance of 5kΩ・cm or higher is recommended
Y-axis magnet coil (optional)		0～±1.2A／±12VDVmax About 1.7Ω（20℃）