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Infrared Gold Image Furnace / RTA System
Variable Atmosphere Lamp Heating System
RTP-6
アルバック販売
80℃ /s high speed annealing possible at low cost.
This infrared lamp heating system with parabolic type reflectors can heat uniformly a wafer of the size up to 6 inches. It is capable of high-speed heat treatment, the most available for the research and development of heat treatment process. Silicide formation in individual semiconductor process and process annealing of compound semiconductor are available.
Features
- Capable of high speed heat treatment.
- VCapable of high speed cooling with the metal chamber cold-wall Cconstruction.
- Gas flow after vacuum displacement is also available.
- Temperature program setting and external signal input is easily executed from a PC.
- Temperature data during heating can also be displayed on a PC.
- A quartz protection plate (optional) can be installed in the chamber to prevent contamination.
- Equipped with various safety measures.
- Capable of excellent temperature distribution and reproducibility with the 9 zone control.
Applications
- Capable of high speed heat treatment.
- Capable of high speed cooling with the metal chamber cold-wall Cconstruction.
- Gas flow after vacuum displacement is also available.
- Temperature program setting and external signal input is easily executed from a PC.
- Temperature data during heating can also be displayed on a PC.
- A quartz protection plate (optional) can be installed in the chamber to prevent contamination.
- Equipped with various safety measures.
- Capable of excellent temperature distribution and reproducibility with the 9 zone control.
Specifications
| Temperature Range | RT～1100℃ |
|---|---|
| Sample Size | 6-inch wafer 1 piece (4 or 5-inch wafer is optional.) |
| Atmosphere | In Static gas, Gas flow, Air, Vacuum (Vacuum pumping system is optional.) |
| Heating Method | Top single-side heating method by paraboloidal surface reflected infrared lamp |
| Maximum Heating Rate | 80℃ /sec |
| Uniform Temp. Precision | ΔT= 10℃ at 800℃ being maintained in N2 |
| Control Sensor | Thermocouple JIS "K" (inserted in SiC coated carbon susceptor), pyrometer (option) |
Heating Chamber
Constitution
- Infrared gold image furnace
- Heat treatment chamber
- Programmable temperature controller
- 9-zone output unit
- Span change unit
- Gas piping system
- Hot air exhaust system
- Frame・Switch board
- Pyrometer (option)
- Cooling water circulation system (option)
- Vacuum exhaust system (option)
System diagram
Utility
| Outside dimensions | Approx. W600 x D1000 x H1700 (mm) (excluding protrusion) |
|---|---|
| Weight | Approx. 300kg |
| Power requirements・grounding | Three phase AC 200V 30kVA, D type |
| Cooling water | City water 15L/min or more, 0.3MPa or more |
| Vacuum exhaust port | KF-25 |
| Gas port | IN: 1/4 Swagelok joint (or equivalent) OUT:3/8 Swagelok joint (or equivalent) |
| Hot air outlet | Approx. Φ50 short tube |
