LIX-2 series|Thermal Expansion Measurment System by Laser Interferometer|Thermal Analysis Evaluation System|Heat Treatment And Thermal Properties|Products|ULVAC SHOWCASE

Thermal Analysis Evaluation System

Thermal Expansion Measurment System by Laser Interferometer

LIX-2 series

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High-accuracy measurement of thermal expansion with a minimum resolution of 1nm
This is a laser thermal expansion measurement system with ultra-high sensitivity developed by the use of the latest optical techniques. This system is suitable to be used as a calibration system for a standard thermal dilatometer, also to measure absolute thermal expansion measurements of unknown samples. This system is compliant with JIS R3251-1995, Measuring method of the linear thermal expansion coefficient for low expansion glass by laser interferometry.

Features

  • Stable measurement is available with a parallel-shifting sample holder.
  • High-accuracy measurement with reading resolution of 1nm
  • With the use of a quartz sample, films or thin plates with thickness of 50 ~ 500μm can be measurable in the thickness direction.

Applications

  • Measurement of organic films in the thickness direction
  • Precise measurement of low expansion glass
  • Quality control measurement of low expansion metal materials
  • Measurement of seal materials
  • Precise measurement of parts of electronic devices
  • Measurement of calibration samples for a standard thermal dilatometer

Specifications

Model LIX-2M LIX-2L
Temperature range RT ~ 700℃ -150 ~ 200℃
Sample size Φ5 ~ 6 × L10 ~ 15 (mm) Both sides in the length direction are finished spherically.
Atmosphere 1. Vacuum 2. Low pressure high purity helium gas
Measurement method Dual path Michelson laser interferometry

Patent and Standard

Complies with JISR 3251-1995 Parallel moving sample holder (patented)

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