RGM2-202|Qulee RGM2 Series|CVD / ALD / Etching Process|Gas Analyzer(Process Gas Monitor)|Products|ULVAC SHOWCASE

CVD / ALD / Etching Process

Qulee RGM2 Series

RGM2-202

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This process monitoring system has been developed for various kinds of applications such as etch, CVD and other reactive gas processes.
Using ULVAC's original ion source and pumping system enables you to achieve stable measurements results.

Features

  • Long term stable measurements results
  • Communication interface Ethernet compatible
  • Closed Ion Source Utilizing a Magnetic Field:
    Soft ionization provides less gas dissociation and higher sensitivity. Decomposition and adsorption due to thermal reactions are minimized in the ionization chamber.
  • Short distance between the process chamber and ion source allows quick-response of analysis.
  • Wide pressure range from 10-6 to 13kPa is available. (Choice of orifices)
  • No need for PC
  • "One Click" function
  • Max 120℃(248?) High temperature bakeing.
  • Electron bombard degas
  • Protection and maintenance of ion source and secondary electron multiplier
  • Traceability of analysis tube (patent pending)
  • Various Leak Tests are Available (Helium leak test, air leak test, leak up)
  • Capable of total pressure measurement (External ionization gauge GI-M2)
  • This software is included and compatible with (Windows 8/10/11)

Applications

For etching and ALD and CVD process

  • Monitoring reactive gases during process
  • End-point monitoring for etching and cleaning processes
  • Residual gas analyzing
  • Leak testing

Specifications

Model RGM2-202 RGM2-302
Sensor
Mass filter type Quadrupole
Mass range 1 to 200 amu 1 to 300 amu
Resolution M/△M=1M (10%P.H.)
Detector type SEM/Faraday cup
Sensitivity 1×10-3 A/Pa
1.33×10? Torr
0.1A/mbar

minimum detectable partial pressure

(inside analyzer tube)

1×10-10 Pa
7.5×10-13 Torr
1×10-12 mbar
Ion source Closed ion source utilizing a magnetic field
Filament Ir/Y2O3 coated V type, 1pc
Ionization voltage 20 to 70 eV
Emission current 10μA
DC amplification range 1×10-5 to 1×10-12 A
Maximum bakeout operating temperature 120℃ (248°F)
Differential pumping system
Gas inlet value Conductance value with 3 different gas inlet modes (VPC-070)
Max. sampling pressure 13kPa
97.5Torr
130mbar
Differential pumping system With intermadiate port and gas purge port
Turbo molecular pump 67L/s:N2
Fore pump DIS090
Pirani vacuum gauge SW1-1
Ionization vacuum gauge GI-M2
Weight Pumping system:57kg / Controller:38kg
Utility
Power supply AC100V 15A
Compressed air Dry N2:0.4 to 0.7MPa (Φ6 one-touch joint)
Dry N2:3×10? to 5.25×10? Torr (Φ6 one-touch joint)
Dry N2:4 to 7 mbar (Φ6 one-touch joint)
Control unit
"One Click" function Capable / He/H2O/N2/O2/Any gas
External I/O and other Analog input×2 (0 to 10V)
Set-point output×2 (fault,alarm)
External interlock
Others
Baking heater Tape heater
Stand Standard
Sensor unit (Control box cable) 5m
Interface Ethernet
Software Qulee QCS Ver. 4.2 later (Windows 8/10/11)
Option PC

該非判定結果報告書 Download

SDS Download

Accessories and Consumables

RGM2-201 F Exclusive Option
VCR Conversion Pipe VCR-NW16 NW Clamp with Centering
VCR Conversion Pipe VCR-NW25 NW Clamp with Centering
VCR Conversion Pipe VCR-NW40 NW Clamp with Centering
RGM2-201 F Exclusive Consumables
analytical tube RGM-AN201F For RGM2-201 F
ion source RGM-IS01F For RGM2-201 F
Filament Kit RGM-FL01F For RGM2-201 F
orifice RGM-OF030F For RGM2-201 F, 0.5~30 Pa
orifice RGM-OF010F For RGM2-201 F, 10~500 Pa
RGM / RGM2-202,302 Exclusive Consumables
Analyzer tube RGM-AN202/302 RGM(2)-202.302 shared
Filament QFL-002 RGM(2)-202.302 shared
Ion source RGM-IS01 RGM(2)-202.302 shared
secondary electron multiplier tube (SEM) QEM-001 RGM(2)-202/302, HGM(2)-202/302 shared
RGM Orifice QOF-100 RGM(2)-202/302, REPROS shared
RGM Orifice QOF-040 RGM(2)-202/302, REPROS shared
RGM Orifice QOF-010 RGM(2)-202/302, REPROS shared
RGM Orifice QOF-005 RGM(2)-202/302, REPROS shared

Instruction Manuals and Specifications Download

Applications Download

Technical drawings Download

Technical Data Download

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