Technology

Measurement examples (Repeatability is the standard deviation (1σ) of the results of 10 consecutive measurements.)

1. Organic EL:Alq3/Glass Single layer film.

img-en-ellipsometer-kiban01.png

The film thickness and refractive index of four samples are measured. The film thickness is highly correlated with a probe type step profiler.

Sample A B C D
Target object Refractive Index Film Thickness Refractive Index Film Thickness Refractive Index Film Thickness Refractive Index Film Thickness
N D(nm) N D(nm) N D(nm) N D(nm)
UNECSmeasurement value 1.712 118.5 1.728 115.8 1.731 115.0 1.729 112.1
Probe type step profiler 118.4 111.8 116.1 109.3

2. Thin film solar cell:SiO2/μc-Si/Glass Bilayer film.

img-en-ellipsometer-kiban02.png

The SiO2 thin film of about 20 nm was measured without any problem. The total film thickness (S SiO2+μc-Si) is highly correlated with a probe type step profiler.

Sample A B C
Measured film μc-Si SiO2 μc-Si+
SiO2
μc-Si SiO2 μc-Si+
SiO2
μc-Si SiO2 μc-Si+
SiO2
UNECSmeasurement value 509.9 18.2 528.1 523.2 13.8 537.0 518.8 21.7 540.4
Probe type step profiler 525.4 541.4 546.3

3. SiO2Single layer film.

Even a thin film of about 2 nm has good a reproducibility (repeatability)

img-en-ellipsometer-kiban03.png

Measured value *1) repeatabilityσ
SiO2film thickness 1.96 nm 0.03 nm

4. Resist Single layer film.(simultaneous measurement of film thickness and refractive index)

Even a thin film of about 2 nm has good a reproducibility (repeatability)

img-en-ellipsometer-kiban04.png

Measured value *1) repeatabilityσ
Resist film thickness (Design film thickness 50 nm) 50.95 nm 0.05 nm
Resist refractive index *2) 1.576 0.02

5. Resist / BARC Bilayer film.

img-en-ellipsometer-kiban05.png

Measured value *1) repeatabilityσ
Resist film thickness (Design film thickness 50 nm) 48.17 nm 0.72 nm
BARCfilm thickness (Design film thickness 65nm) 67.16 nm 0.76 nm

6. Resist Three layer film.(simultaneous measurement of film thickness and refractive index)

The film thickness and refractive index of the topcoat(top layer) are measured simultaneously.

img-en-ellipsometer-kiban06.png

Measured value *1) repeatabilityσ
Topcoat film thickness (Design film thickness 30 nm) 28.79 nm 0.05 nm
Topcoat refractive index *2) 1.342 0.001

7. ALDdeposition HfO2 (hafnium oxide) ultra-thin film.

The measured HfO2 film thickness (5.85 nm, 2.46 nm) near the center of the wafer almost matched with the measured value (6.0 nm, 2.5 nm) by TEM (transmission electron microscope). (The reliability of measurement by UNECS was confirmed.)

【Measurement Model】

Type of Film.
Top layer HfO2
Middle layer SiO2
Substrate Si wafer

【Measurement Result】

Sample Film Thickness Film thickness near the center
(nm)
Maximum value
(nm)
Minimum value
(nm)
Average value
(nm)
Uniformity
(%)
5nm Hfo2/Natural oxide film/Si substrate 6.12 5.63 5.83 4.2% 5.85
2nm Hfo2/Natural oxide film/Si substrate 2.56 2.37 2.45 3.9% 2.46

UNECS1.png

Technology

Solution

This website use cookies to obtain and use access data to understand the convenience and usage of customers. If you agree to use cookies, click "I Accept".
[Privacy Plicy] [Cookie Policy]

I Accept