Introduction of vacuum equipments manufactured by ULVAC Group.

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EB deposition (Electron Beam Evaporation) is a technology that uses an electron beam to heat and evaporate materials, forming thin films on a substrate. This technique is characterized by its ability to produce high-precision and high-purity films, making it widely applicable across various fields. It is particularly suitable for depositing high-melting-point materials and films requiring high purity, and is utilized in a wide range of industries, including optics, electronics, and decorative applications.

EB deposition (Electron Beam Evaporation) is utilized in various fields. Its applications can be broadly classified into two types of films, with the main examples as follows: ① Optical Thin Films ・Anti-reflection coatings (AR coatings) on lenses and mirrors ・Reflective and interference films (e.g., laser optical components and filters) ・High-precision multilayer coatings for optical elements ② Metal Films ・Formation of electrode films in the manufacturing of semiconductors, integrated circuits (ICs), and power devices ・Surface coatings for decorative items The key to successful EB deposition lies in managing the following points properly. ・Management of the vacuum environment ・Control of the electron beam ・Quality management of materials and substrates ・Stabilization of film thickness and deposition rate By properly managing these factors and ensuring thorough safety measures, stable processes and high-quality thin film formation can be achieved.

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Electron Beam Source

Flat Top_EB source for metal_EGN series

EGNseries

The EGN series is a metal vapor deposition electron beam evaporation source newly developed with a focus on improving maintainability.
The use of a flat-top structure reduces the area of adhesion to the electron beam evaporation source, achieving high maintainability.

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EB source for optical_EGO series

EGOseries

Based on ULVAC's many years of technology, this highly reliable EB gun has been developed especially for optics.

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Laboratory_EB source for metal_EGK series

EGKseries

The EGK-3 electron beam evaporation source is the result of ULVAC's many years of technology accumulation and track record to improve performance and reliability.
This evaporation source has a hearth with a maximum input power of 5 kW.
The crucible capacity is 2.6cc, making it suitable for experiments and small-scale production.

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EB source for metal_EGL series

EGLseries

The EGL series of electron beam evaporation sources are the result of ULVAC's many years of technology accumulation and track record to improve performance and reliability. The EGL series has a lineup of various types of guns, and can be used for arbitrary multilayer film deposition, high-speed deposition of thick films, and experiments in ultra-high vacuum.

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EB source_Option

EBoption

The following are available as optional ancillary equipment. Please select according to your needs.

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Power supply for EB source

The Electron Beam Sources (electron beam gun) for EB deposition is a device that uses an electron beam to heat and evaporate materials. Compared to traditional resistance heating, it can achieve higher temperatures, allowing efficient evaporation of materials with high melting points. Additionally, it features high precision and the ability to form uniform thin films. ULVAC offers a lineup of Electron Beam Sources (electron beam guns) to meet various application needs.

Power supply for EB source_HPS series

HPSseries

Based on ULVAC's many years of technology accumulation and achievements, this power supply is compatible with electron beam evaporation sources that stabilizes circuits and improves performance.
When used in combination with the EGC-10GS EB gun controller, it can be used for both optical thin film EB guns and metal thin film EB guns.

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