Electron Beam Source
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EB deposition (Electron Beam Evaporation) is a technology that uses an electron beam to heat and evaporate materials, forming thin films on a substrate. This technique is characterized by its ability to produce high-precision and high-purity films, making it widely applicable across various fields. It is particularly suitable for depositing high-melting-point materials and films requiring high purity, and is utilized in a wide range of industries, including optics, electronics, and decorative applications.
EB deposition (Electron Beam Evaporation) is utilized in various fields. Its applications can be broadly classified into two types of films, with the main examples as follows: ① Optical Thin Films ・Anti-reflection coatings (AR coatings) on lenses and mirrors ・Reflective and interference films (e.g., laser optical components and filters) ・High-precision multilayer coatings for optical elements ② Metal Films ・Formation of electrode films in the manufacturing of semiconductors, integrated circuits (ICs), and power devices ・Surface coatings for decorative items The key to successful EB deposition lies in managing the following points properly. ・Management of the vacuum environment ・Control of the electron beam ・Quality management of materials and substrates ・Stabilization of film thickness and deposition rate By properly managing these factors and ensuring thorough safety measures, stable processes and high-quality thin film formation can be achieved.
Flat Top_EB source for metal_EGN series
Flat-Top Electron Gun with an Advanced Secondary Electron Absorption Mechanism
Flat Top_EB source for metal_EGN series
Model:EGN
The "Model:EGN" is a metal vapor deposition electron beam evaporation source newly developed with a focus on improving maintainability.
The use of a flat-top structure reduces the area of adhesion to the electron beam evaporation source, achieving high maintainability.
Laboratory_EB source for metal_EGK series
Compact Experimental Electron Gun for Versatile Testing
Laboratory_EB source for metal_EGK series
Model:EGK
The EGK-3 electron beam evaporation source is the result of ULVAC's many years of technology accumulation and track record to improve performance and reliability.
This evaporation source has a hearth with a maximum input power of 5 kW.
The crucible capacity is 2.6cc, making it suitable for experiments and small-scale production.
EB source for metal_EGL series
Versatile Electron Gun for Metal Film Production with a Proven Track Record
EB source for metal_EGL series
Model:EGL
The "Model:EGL" of electron beam evaporation sources are the result of ULVAC's many years of technology accumulation and track record to improve performance and reliability. The "Model:EGL" has a lineup of various types of guns, and can be used for arbitrary multilayer film deposition, high-speed deposition of thick films, and experiments in ultra-high vacuum.
EB source for optical_EGO series
Versatile Electron Gun for Optical Film Production with a Proven Track Record
EB source for optical_EGO series
Model:EGO
Based on ULVAC's many years of technology, this highly reliable EB gun has been developed especially for optics.
EB source_Option
Electron Gun Options Available for Various Requirements
EB source_Option
EBoption
The following are available as optional ancillary equipment. Please select according to your needs.