Power supply for EB source
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The Electron Beam Sources (electron beam gun) for EB deposition is a device that uses an electron beam to heat and evaporate materials. Compared to traditional resistance heating, it can achieve higher temperatures, allowing efficient evaporation of materials with high melting points. Additionally, it features high precision and the ability to form uniform thin films. ULVAC offers a lineup of Electron Beam Sources (electron beam guns) to meet various application needs.
The Electron Beam Sources (electron beam gun) plays a central role in the EB deposition process and performs the following functions: Generation of Electron Beam The electron gun emits a high-energy electron beam. Heating of Material The emitted electron beam irradiates the deposition material (e.g., metal or oxide), causing localized high-temperature heating through its energy. Evaporation of Material The heated material evaporates and diffuses within the vacuum chamber. Thin Film Formation The evaporated material deposits on the substrate surface, forming a uniform and high-quality thin film. We offer a wide range of electron guns tailored to meet various customer applications and processes. Please feel free to consult with us for assistance in selecting the most suitable Electron Beam Sources for your needs.
Power supply for EB source_HPS series
Power Supply for Electron Guns Supporting a Wide Range of Deposition Processes
Power supply for EB source_HPS series
Model:HPS
Based on ULVAC's many years of technology accumulation and achievements, this power supply is compatible with electron beam evaporation sources that stabilizes circuits and improves performance.
When used in combination with the EGC-10GS EB gun controller, it can be used for both optical thin film EB guns and metal thin film EB guns.