Infrared Gold Image Furnace / RTA System|Heat Treatment And Thermal Properties|Products|ULVAC SHOWCASE

Infrared Gold Image Furnace / RTA System

SHOWCASE

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Infrared Gold Image Furnace

Infrared Gold Image Furnace

RHL-E/VHT/P series

Meeting customer needs with infrared lamp heating
Infrared Gold Image Furnaces can be used in many fields for research and development or as production equipment.
We're meeting the needs of our customers from high speed heating to wide area heating.

Infrared Gold Image Furnace

Ps,Pss series

Useable in wide fields from carbon nanotube growth equipment to production equipment.
The flat plate reflected infrared heating furnace can be used for applications such as a 2-inch to 300 mm diameter wafer lamp annealing system or a production baking furnace.

Programmable Temperature Controller

Programmable Temperature Controller

TPC-5000 series

Temperature controller capable of supporting high-speed heating with good precision.
This programmable temperature controller can support not only Infrared Gold Image Furnaces that require a fast response during high-speed heating , but also low-speed heating furnaces.
It features high functionality and high performance in a compact package and meets your needs with a low price and many accessories.

Rapid Thermal Annealing System

Rapid Thermal Annealing System

RTA series

High speed heat treatment from 2 inches to 300 mm 10 seconds until retention. Infrared lamp heating is the method which can take advantage of its features of High energy density, Near infrared rays, High heat responsiveness, Temperature controllability, and Cold wall method.

Variable Atmosphere Lamp Heating System

Variable Atmosphere Lamp Heating System

RTP-6

This infrared lamp heating system with parabolic type reflectors can heat uniformly a wafer of the size up to 6 inches. It is capable of high-speed heat treatment, the most available for the research and development of heat treatment process. Silicide formation in individual semiconductor process and process annealing of compound semiconductor are available.

Variable Atmosphere Lamp Heating System

QHC series / VHC series

Helping process development From solar cells to compound semiconductors.
Combining an Infrared Gold Image Furnace and temperature controller, the QHC/VHC series is a compact high speed heating/ cooling system equipped with a quartz heat treatment chamber.
The system is customizable to your needs.

Mini Lamp Annealer

Mini Lamp Annealer

MILA-5050

This system is a Mini Lamp Annealer that enables the heat treatment up to 50mm square size samples.
MILA-5000 series, the current models which are available for up to 20mm square size samples, have been velued by many customers since their release. But in response to increased number of demands from customers that they want to heat bigger samples, this new system, available for heat treatment of up to 50mm square size samples has been developed with still having a compact body in which heating furnace, chamber and temperature controller are all integrated.

Mini Lamp Annealer

MILA-5000 series

Mini Lamp Annealer with air-cooling system

Mini Lamp Annealer with air-cooling system

MILA-700AR

A desktop lamp heating device that does not use cooling water.
As the air cooling fan is used, the device can be used immediately if there is an outlet.

Simplified Infrared Lamp Heating System

Simplified Infrared Lamp Heating System

SSA series

Simplified system with Infrared Gold Image Furnace and a quartz chamber.
A low-cost heating system consist of an Infrared Golc Image Furnace and quartz chamber including a sample holder.

Spot Focused Infrared Gold Image Furnace System Series

Spot Focused Infrared Gold Image Furnace System Series

MIRO series

Heating up to 1800℃ in just 1 min. For ultra-high temperature vacuum heat treatment MIRO series is a compact spot focused Gold Image Furnace which enables to heat up to 1800℃ with extremely high reflection efficiency in combination with single or double type chambers.

Rapid Heating / Water Quenching System

Rapid Heating / Water Quenching System

CAS-MR59AQ

Rapid heating and quenching of materials
This system is capable of water quench after heating. The maximum temperature is 1800℃ under various atmospheres.

High Temperature Rapid Thermal Annealing System

High Temperature Rapid Thermal Annealing System

HT-RTA59HD

Heating a small piece of sample up to 1800°C just in 10 seconds.
HT-RTA59HD is a desktop-type lamp annealing system which enables a small piece of sample to heat up to 1800°C (Ultrahigh temperature zone) just in 10 seconds with high reflection efficiency by spot focused heating.

Production Heat Treatment Furnace

Production Heat Treatment Furnace

Production Heat Treatment Furnace (Manufacturing Line Equipment)

Heationg system according to heat treatment objective
This heating system is desiged based on the shape of the material and the heat treatment objective in the process.
By making maximum use of high-speed heating, cooling and clean heating, we provide heating furnaces with non-polluting, low energy and high functionality.


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