Nano-particle Deposition System
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Arc Plasma Source
Arc Plasma Source
APS-1
Simultaneous deposition of different "targets"
By adding this source to APD series or your vacuum chamber, different "targets" can be deposited simultaneously and materials with new characters can be produced.
Arc-Plasma method nano-particle Deposition System
Arc-Plasma method nano-particle Deposition System
APD series
New nanoparticle deposition system using pulse vacuum arc discharge
Pulse vacuum arc deposition is a unique technique to deposit ultrathin films and nanoparticles by generating metal ions in a simple process. This system can achieve high in terms of film flatness and particle fineness, which is impossible with other systems.