Introduction of vacuum equipments manufactured by ULVAC Group.
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A plasma generation power supply, also known as a deposition power supply, is a device that generates plasma by applying voltage between electrodes. By utilizing this technology, various vacuum processes such as PVD (e.g., sputtering), CVD, etching, and ashing can be performed. These processes enable the formation or removal of films on substrates, thereby creating new added value. This technology is widely applied in many everyday products around us.
The formation of various films adds value, transforming into products that are familiar in our daily lives. The industries related to this technology are extremely diverse, spanning semiconductors, electronic devices, displays, renewable energy, storage, and automotive sectors. In film deposition, the selection of film materials and processes is crucial. Additionally, considering production efficiency and quality, choosing the appropriate power supply is a vital factor. Film deposition processes include PVD (such as sputtering), CVD, etching, and ashing, each requiring a suitable power supply. The optimal power supply differs depending on the process adopted and the type of film to be formed. Therefore, it is essential to fully understand the characteristics of each power supply and select the one that best suits the intended purpose. For instance, when high-precision films are required or when handling mass production, power supplies that meet specific requirements are necessary. It is also common to use multiple power supplies in combination, leveraging each company's unique expertise. The process-power supply comparison table introduced here serves as a general reference and does not cover all processes or applications. It is crucial to carefully select the most suitable power supply based on specific applications.
Type
Pulsed and DC power supply systems
ULVAC’s pulse and DC power supply systems offer a comprehensive product lineup to support various sputtering processes:
・DC Power Supply (Direct Current): DC Series / Digital DC Series
・DC Pulse Power Supply: DC PULSE Series
・LF Power Supply: SG
・External Accessories: A2K Series / MFU
These products are equipped with features to address challenges in the sputtering process and can be utilized across a wide range of fields and applications, from research and development to production lines.
DC power supply_DC series
Model:DC
The "Model:DC" is a direct current power supply (DC power supply) for sputtering. It is composed of reliable components and circuits. It is a highly reliable power supply that is ideal for plasma loads by reflecting the know-how we have cultivated over many years, including the application of power supplies, in the design.
DC power supply_Digital DC series
Model:Digital DC
The Digital "Model:DC" is a DC power supply for sputtering. It is composed of reliable components and circuits. It is a highly reliable power supply that is ideal for plasma loads by reflecting the know-how we have cultivated over many years, including the application of power supplies, in the design.
DC PULSE power supply_DC PULSE series
Model:DC PULSE
The "Model:DC PULSE" is a pulsed power supply that is effective in suppressing abnormal discharges that occur in reactive processes.
This power supply reverses the output voltage at a set period and cancels out charge accumulation (charge-up) on the target surface, thereby suppressing abnormal discharge and improving yield and throughput.
LF power supply_SG
Model:SG-10
It is designed for plasma generation such as LF power supply, dual cathode sputtering, plasma CVD, etc., and can continuously output rated power at frequencies from 20kHz to 100kHz for plasma loads. Highly reliable and ideal for plasma loads that reflect know-how including power supply applications cultivated over many years in the design
Power supply.
PULSE unit _A2K Series
Model:A2K
The "Model:A2K", which is available as an external unit for DC power supplies, is an abnormal discharge prevention unit that converts a DC output into a pulse output and neutralizes the charge on the target.
Bipolar unit _MFU
Model:MFU-20K
The MFU, which is available as an external unit for DC power supplies, is an MF power supply for use in sputtering of dual cathodes. It is effective not only for metal films but also for reactive deposition. Stable sputtering is achieved without the loss of the anode.
RF Power System
Built-in matcher_RF power supply_RMG
Model:RMG-1303
The RMG-1303 is a 13.56MHz, 300W RF power supply with built-in output matcher for plasma processes such as RF sputtering and plasma CVD etching. The integration of the matcher and the RF power supply makes it smaller and lighter. It can be controlled from low output, and can be used in a wide range of fields, from R&D applications to mass production equipment.
RF power supply_N series
Model:N
The "Model:RFS-N" is a 13.56MHz, 0.5kW/1/kW/3kW/5kW output RF power supply for plasma processing. Equipped with a high-efficiency RF amplifier, it is compact and lightweight.
In addition, the RF power supply has a built-in auto-matching controller function, so it is possible to control the power of the RF power supply and the matching system with only the main unit.
RF power supply_Option
Model:MEX-N
This is a switching machine for matching boxes for power supplies for plasma generation such as RF sputtering, plasma CVD, etching, etc.
RF power supply_Option
Model:EXN
The "Model:EXN" is a target switcher that can be used to switch the power supply destination for multiple DC sputtering electrodes and RF sputtering electrodes, or to switch the output of multiple DC power supplies or RF power supplies to a single electrode
RF power supply_Option
Model:PHS-N
The system is designed to phase out plasma generation power supplies such as RF sputtering, plasma CVD, and etching.
The system can arbitrarily change the phase of the output of multiple RF power supplies operating at 13.56 MHz.
RF power supply_Option
Model:EXO-13
This unit is designed as an external oscillator source for high-frequency power supplies. It is capable of outputting a rated signal at a single frequency of 13.56 MHz.
In addition, this unit is equipped with 1~4 BNC output ports, which can perform high-frequency oscillation in the same phase for up to 4 power supplies.
* The external input terminal of the connected power supply must be terminated to 50 Ω and must be able to operate at a distance of 10 mW to 100 mW.