RF Power System
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Built-in matcher_RF power supply_RMG
The RMG is an innovative RF power supply system that integrates an RF power supply and a matching unit into a single unit. By combining these elements, which are typically separate components, the system achieves a lightweight and compact design, making it suitable for experimental and trial applications.
Additionally, it allows precise control even at low power outputs, making it applicable across a wide range of fields, from research and development to mass production equipment. The RMG offers a flexible and convenient RF power solution.
Built-in matcher_RF power supply_RMG
Model:RMG-1303
The RMG-1303 is a 13.56MHz, 300W RF power supply with built-in output matcher for plasma processes such as RF sputtering and plasma CVD etching. The integration of the matcher and the RF power supply makes it smaller and lighter. It can be controlled from low output, and can be used in a wide range of fields, from R&D applications to mass production equipment.
RF power supply_N series
The N Series RF Power Supply offers high versatility by allowing a wide matching range through adjustments to the matching unit settings, enabling compatibility with various loads. Additionally, it achieves a compact and lightweight design by incorporating a high-efficiency RF amplifier.
Furthermore, the RF power supply unit features a built-in auto-matching controller, which eliminates the need for additional external devices. This integration allows seamless control of both power output and the matching system. The N Series represents a next-generation RF power supply system that combines high performance and convenience.
RF power supply_N series
Model:N
The "Model:RFS-N" is a 13.56MHz, 0.5kW/1/kW/3kW/5kW output RF power supply for plasma processing. Equipped with a high-efficiency RF amplifier, it is compact and lightweight.
In addition, the RF power supply has a built-in auto-matching controller function, so it is possible to control the power of the RF power supply and the matching system with only the main unit.
RF power supply_Option
By utilizing Ulvac's RF power supply options, it is possible to achieve a wide variety of equipment configurations. We offer a comprehensive lineup that addresses various needs, including interference issues during multiple simultaneous discharges and switching between power outputs.
RF power supply_Option
Model:MEX-N
This is a switching machine for matching boxes for power supplies for plasma generation such as RF sputtering, plasma CVD, etching, etc.
RF power supply_Option
Model:EXN
The "Model:EXN" is a target switcher that can be used to switch the power supply destination for multiple DC sputtering electrodes and RF sputtering electrodes, or to switch the output of multiple DC power supplies or RF power supplies to a single electrode
RF power supply_Option
Model:PHS-N
The system is designed to phase out plasma generation power supplies such as RF sputtering, plasma CVD, and etching.
The system can arbitrarily change the phase of the output of multiple RF power supplies operating at 13.56 MHz.
RF power supply_Option
Model:EXO-13
This unit is designed as an external oscillator source for high-frequency power supplies. It is capable of outputting a rated signal at a single frequency of 13.56 MHz.
In addition, this unit is equipped with 1~4 BNC output ports, which can perform high-frequency oscillation in the same phase for up to 4 power supplies.
* The external input terminal of the connected power supply must be terminated to 50 Ω and must be able to operate at a distance of 10 mW to 100 mW.