RF Power System
RF power supply_Option
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By utilizing Ulvac's RF power supply options, it is possible to achieve a wide variety of equipment configurations. We offer a comprehensive lineup that addresses various needs, including interference issues during multiple simultaneous discharges and switching between power outputs.
RF power supply_Option
Model:MEX-N
This is a switching machine for matching boxes for power supplies for plasma generation such as RF sputtering, plasma CVD, etching, etc.
RF power supply_Option
Model:EXN
The "Model:EXN" is a target switcher that can be used to switch the power supply destination for multiple DC sputtering electrodes and RF sputtering electrodes, or to switch the output of multiple DC power supplies or RF power supplies to a single electrode
RF power supply_Option
Model:PHS-N
The system is designed to phase out plasma generation power supplies such as RF sputtering, plasma CVD, and etching.
The system can arbitrarily change the phase of the output of multiple RF power supplies operating at 13.56 MHz.
RF power supply_Option
Model:EXO-13
This unit is designed as an external oscillator source for high-frequency power supplies. It is capable of outputting a rated signal at a single frequency of 13.56 MHz.
In addition, this unit is equipped with 1~4 BNC output ports, which can perform high-frequency oscillation in the same phase for up to 4 power supplies.
* The external input terminal of the connected power supply must be terminated to 50 Ω and must be able to operate at a distance of 10 mW to 100 mW.