CVD / ALD / Etching Process
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The process gas monitor Qulee RGM2 Series is a gas analysis device designed for CVD, etching, and ALD processes. It allows for long-term stable measurements even under reactive and corrosive gas conditions. In addition to endpoint monitoring in cleaning processes, it is also optimal for leak monitoring, residual moisture monitoring, and monitoring other impurities. It is best suited for yield management and improves production efficiency.
CVD / ALD / Etching Process
Model:RGM2-201F
The Qulee RGM2-201 F reactive process gas monitor is a process monitor with a differential exhaust system that supports reactive gases such as etching, CVD and ALD equipment of the Model:Qulee. With the unique ion source and exhaust system structure of Alvac, it has excellent corrosion resistance for reactive gases and can be measured stably for a long time.
CVD / ALD / Etching Process
Model:RGM2-202
This process monitoring system has been developed for various kinds of applications such as etch, CVD and other reactive gas processes.
Using ULVAC's original ion source and pumping system enables you to achieve stable measurements results.
CVD / ALD / Etching Process
Model:RGM2-302
This process monitoring system has been developed for various kinds of applications such as etch, CVD and other reactive gas processes.
Using ULVAC's original ion source and pumping system enables you to achieve stable measurements results.