Sputtering Process
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The process gas monitor Qulee CGM2 Series is a gas analysis device designed for sputtering processes. It is ideal for leak monitoring, residual moisture monitoring, and monitoring other impurities. It enables yield management and improves production efficiency.
Sputtering Process
Model:CGM2-051 / 052
"Qulee" (pronounced as "KLEE"), is ULVAC's latest model for residual gas analysis and gas monitoring during process. Feedback from facility engineers in various production lines are incorporated in the new product design offering utmost simplicity.
The Qulee offers high accuracy and resolution even at high pressure (1Pa or less).
Sputtering Process
Model:CGM2-101 / 102
New Product
The "Qulee" (pronounced "KLEE") is ULVAC's latest model for residual gas analysis and gas monitoring during the process. Feedback from equipment engineers on each production line has been incorporated into the new product design in pursuit of simplicity.
Measurements can be made with high accuracy at the process pressure of the sputtering equipment (less than 1 Pa) without using a differential exhaust system.