Versatile Electron Gun for Optical Film Production with a Proven Track Record
Electron Beam Source
EB source for optical_EGO series
Model:EGO
ULVAC
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Based on ULVAC's many years of technology, this highly reliable EB gun has been developed especially for optics.
Features
- Since the electron beam is deflected by an electromagnetic field, the effect of secondary electrons on the deposited body is extremely small.
- Even sublimable materials can be evaporated smoothly by scanning the beam spot on the X and Y axes, eliminating the phenomenon of burrowing. (Japan Country Patent 831485, No. 843447)
- The electron beam is 270° deflected, so it is not exposed to vapors from the evaporated material, and the filament has a long service life.
- The emitter assembly is easy to attach and detach, making it easy to replace filaments, insulators, etc.
Specifications
| Model | EGO-1G | EGO-40M | |
| Electron beam deflection angle | 270° | ||
| Number of crucibles | 0 | 4 | |
| Crucible capacity | - | 10cc ×2 / 40cc ×2 | |
| Crucible Dimensions: Top × Bottom× Depth | - | 32Φ×24Φ×15H（mm）/50Φ×41Φ×25H（mm） | |
| Cooling water | Hearth | - | 10L/min以上 |
| other | 2L/min | 2L/min | |
| DimensionsDimensions(W×D×H) does not contain protrusions | 166×285×174（mm） | 170×309×174（mm） | |
| weight | Approx. 12.5kg | Approx. 18kg | |
| Deposition rate | - | - | |
| Maximum accelerating voltage | -10kV | ||
| Maximum Emission Current | 1.0A | 0.6A/1.0A | |
| Applicable power supply | HPS-1000N-100/HPS-1000N-200 | ||
