Versatile Electron Gun for Metal Film Production with a Proven Track Record

Electron Beam Source
EB source for metal_EGL series Model:EGL

ULVAC

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The "Model:EGL" of electron beam evaporation sources are the result of ULVAC's many years of technology accumulation and track record to improve performance and reliability. The "Model:EGL" has a lineup of various types of guns, and can be used for arbitrary multilayer film deposition, high-speed deposition of thick films, and experiments in ultra-high vacuum.

Features

Since the electron beam is deflected by an electromagnetic field, the effect of secondary electrons on the deposited body is extremely small.
Even sublimable materials can be evaporated smoothly by scanning the beam spot on the X and Y axes, eliminating the phenomenon of burrowing. (Japan Country Patent 831485, No. 843447)
The electron beam is 270° deflected, so it is not exposed to vapors from the evaporated material, and the filament has a long service life.
The emitter assembly is easy to attach and detach, making it easy to replace filaments, insulators, etc.

Specifications

Model		EGL-103S	EGL-35	EGL-35M	EGL-110	EGL-80M
Electron beam deflection angle		270°
Number of crucibles		3	1	4	1	4
Crucible capacity		10cc	40cc	40cc ×2/10cc×2	110cc
Crucible Dimensions: Top × Bottom× Depth		35Φ×31Φ×11H	50Φ×41Φ×25H	50Φ×41Φ×25H/32Φ×24Φ×15H	75Φ×59Φ×32H	75Φ×57Φ×32H
Cooling water	Volume Crucible	10L/min or more			19L/min or more	20L/min or more
Cooling water	coil	2L/min or more	-	2L/min or more	ー	4L/min or more
Dimensions W×D×H		313 ×250×108 mm	160×206×79 mm	170×240×156 mm	136×220×90 mm	265×318×168 mm
weight		16kg	10kg	18kg	15kg	30kg
Deposition rate		-	1.8μm/min or more （Al/8kW/250H directly above the hearth)	1.6μm/min or more （Al/8kW/250H directly above the hearth)	4.5μm/min or more （Al/16kW/250H directly above the hearth)	4μm/min or more （A\| 16kW,/250H directly above the hearth)
Maximum accelerating voltage		-10kV
Maximum Emission Current		0.6A	1.0A		1.6A
Applicable power supply		HPS-1000N-100/HPS-1000N-200			HPS-1600F-DS100/ HPS-1600F-DS200	HPS-1600F-DS101

Features

Since the electron beam is deflected by an electromagnetic field, the effect of secondary electrons on the deposited body is extremely small.

Even sublimable materials can be evaporated smoothly by scanning the beam spot on the X and Y axes, eliminating the phenomenon of burrowing. (Japan Country Patent 831485, No. 843447)

The electron beam is 270° deflected, so it is not exposed to vapors from the evaporated material, and the filament has a long service life.

The emitter assembly is easy to attach and detach, making it easy to replace filaments, insulators, etc.

Specifications

Model		EGL-103S	EGL-35	EGL-35M	EGL-110	EGL-80M
Electron beam deflection angle		270°
Number of crucibles		3	1	4	1	4
Crucible capacity		10cc	40cc	40cc ×2/10cc×2	110cc
Crucible Dimensions: Top × Bottom× Depth		35Φ×31Φ×11H	50Φ×41Φ×25H	50Φ×41Φ×25H/32Φ×24Φ×15H	75Φ×59Φ×32H	75Φ×57Φ×32H
Cooling water	Volume Crucible	10L/min or more			19L/min or more	20L/min or more
Cooling water	coil	2L/min or more	-	2L/min or more	ー	4L/min or more
Dimensions W×D×H		313 ×250×108 mm	160×206×79 mm	170×240×156 mm	136×220×90 mm	265×318×168 mm
weight		16kg	10kg	18kg	15kg	30kg
Deposition rate		-	1.8μm/min or more （Al/8kW/250H directly above the hearth)	1.6μm/min or more （Al/8kW/250H directly above the hearth)	4.5μm/min or more （Al/16kW/250H directly above the hearth)	4μm/min or more （A\| 16kW,/250H directly above the hearth)
Maximum accelerating voltage		-10kV
Maximum Emission Current		0.6A	1.0A		1.6A
Applicable power supply		HPS-1000N-100/HPS-1000N-200			HPS-1600F-DS100/ HPS-1600F-DS200	HPS-1600F-DS101

Electron Beam Source EB source for metal_EGL series Model:EGL

Features

Specifications

Features

Specifications

Electron Beam Source
EB source for metal_EGL series Model:EGL