Phase Shift Unit to Resolve Discharge Interference and Adjust Voltage Equally Between Electrodes
RF Power System
RF power supply_Option
Model:PHS-N
ULVAC
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The system is designed to phase out plasma generation power supplies such as RF sputtering, plasma CVD, and etching.
The system can arbitrarily change the phase of the output of multiple RF power supplies operating at 13.56 MHz.
Features
- It is possible to control the phase of multiple RF power supplies.
- The phase shift function adjusts for cathode-to-cathode differences and provides a stable process with little variation.
Specifications
| 型式 | PHS-04N | PHS-08N | |
| Input Specifications | Input voltage | single-phase AC100V-240V | |
| Input Capacitance | 70VA or less | ||
| Output Specifications | Number of Output Channels | 4 | 8 |
| Oscillation frequency | 13.56MHz±0.05% | ||
| Phase setting range | 0°～359.9° | ||
| DimensionsDimensions(W×D×H) does not contain protrusions |
480×192×49（mm） | ||
