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RF Power Supply Option
MEX-N Series
MEX3N-1k
アルバック
This is a switching device for the matching box of the power supply for plasma generation such as RF sputtering, plasma CVD, and etching.
Features
- Switching for multiple matching boxes.
- Not for simultaneous discharge. Using this unit reduces quantity of power supplies and leads to cost down.
- Various cathodes with different impedance are selectable because individual matching box is used to individual cathode.
Specifications
| Capacity | Qty. of matching box which is switchable by the matching box switching unit | ||||||
| 2 units | 3 units | 4 units | 5 units | 6 units | 7 units | 8 units | |
| 500, 1kW | MEX2N-1k | MEX3N-1k | MEX4N-1k | MEX5N-1k | MEX6N-1k | MEX7N-1k | MEX8N-1k |
| 3kW | MEX2N-3k | MEX3N-3k | MEX4N-3k | MEX5N-3k | MEX6N-3k | MEX7N-3k | MEX8N-3k |
| 5kW | MEX2N-5k | MEX3N-5k | MEX4N-5k | - | - | - | - |
