RFS-201|Sputtering System|Small Film Forming Equipment|Products|ULVAC SHOWCASE

Sputtering System RFS-201

ULVAC

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Small-sized high-frequency sputtering device with an RF power supply.
Ideal for basic research and development experiments because of the deposition capabilities for metals, semiconductors and insulators.

Features

  • It is sputtering system of an insulator, metal, and a semiconducting material.
  • Oil diffusion pump is used for main pumping.
  • Single deposition is available by dia.80 mm, 1 cathode.
  • Sputtering speed 20nm/min. (SiO2) is available by conventional sputtering.

Specification

Model RFS-201
Vacuum performance Ultimate pressure 6.6×10-4Pa
Evacuation time 6.6×10-3Pa/5min
Vacuum chamber Vacuum chamber Metal chamber (200mm(W)×250mm(D)×150mm(H))
Cathode Φ80mm、1way
Standard target Φ80mm×t1-5mm
Effective area of sputtering 50mm
Sputtering speed SiO2 SiO2, more than 20nm/min at deposition
Film thickness distribution SiO2 SiO2, within ±8% at dia.50mm
Substrate heating temperature Max 350℃
Max 350 degrees C 30~50mm(Variable)
Exhaust system Main pump Oil diffusion pump(Water cooling) 150L/sec
Liquid Nitrogen trap Option
Sub pump Oil rotary pump100L/min
Oil mist trap Oil mist trap OMT-100A
Operation system Main valve Clapper valve
Sub valve Three way valve
Automatic leak valve Option
Control Manual control
Control system RF power supply Max 300W (0~300W Variable)
Pirani vacuum gauge G-TRAN
Ionization vacuum gauge Option
Setup Extreial dimensions 764mm(W)×723mm(D)×1648mm(H)
Weight 260kg

Utility

Model RFS-201
Power required 200V Single phase 50/60Hz 2.8kVA
Ground terminal A grade (ground resistance/10Ω or less)
Water requirement 5.0 L/min (Water temperature : less than 25 degrees C, Water pressure : 200 ? 300kPa (gauge pressure))
Connection (power supply) Vinyl cabtyre cable (with R2-5 ring tongue terminals) 4m
Connection (ground) Earth cable (sheet copper) 4m
Connection (water piping) Tetoron Braided hose (O.D.dia.15mm × I.D.dia.9mm) 4m (2 lines)

Dimension drawing

zu_rfs201.gif

Feedthrough Collar

Basic composition

zu_rfs201_fc.gif

[1] Chamber
[2] Taeret electrode
[3] Substrate electrode
[4] Shutter
[5] Current guide terminal
[6] Thermocouple introduction terminal
[7] Gauge port
[8] Sample holder
[9] Backing plate
[10] Target
[11] Service port
[12] Front door

Sample holder drawing

[The standard type]

zu_rsf200_holdere.gif

※We customize according to the purpose of research and development.

Optional parts

●Liquid Nitrogen trap ●Ionization vacuum gauge
●Magnetron ●In line trap (OMI-100)
●Turbo molecular pump ●DC power supply
●Introduction gas (2,3 lines) ●Automatic leak valve for oil rotary pump

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