Sputtering System RFS-201
ULVAC

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Small-sized high-frequency sputtering device with an RF power supply.
Ideal for basic research and development experiments because of the deposition capabilities for metals, semiconductors and insulators.
Features
- It is sputtering system of an insulator, metal, and a semiconducting material.
- Oil diffusion pump is used for main pumping.
- Single deposition is available by dia.80 mm, 1 cathode.
- Sputtering speed 20nm/min. (SiO2) is available by conventional sputtering.
Specification
Model | RFS-201 | |
Vacuum performance | Ultimate pressure | 6.6×10-4Pa |
Evacuation time | 6.6×10-3Pa/5min | |
Vacuum chamber | Vacuum chamber | Metal chamber (200mm(W)×250mm(D)×150mm(H)) |
Cathode | Φ80mm、1way | |
Standard target | Φ80mm×t1-5mm | |
Effective area of sputtering | 50mm | |
Sputtering speed | SiO2 SiO2, more than 20nm/min at deposition | |
Film thickness distribution | SiO2 SiO2, within ±8% at dia.50mm | |
Substrate heating temperature | Max 350℃ | |
Max 350 degrees C | 30~50mm(Variable) | |
Exhaust system | Main pump | Oil diffusion pump(Water cooling) 150L/sec |
Liquid Nitrogen trap | Option | |
Sub pump | Oil rotary pump100L/min | |
Oil mist trap | Oil mist trap OMT-100A | |
Operation system | Main valve | Clapper valve |
Sub valve | Three way valve | |
Automatic leak valve | Option | |
Control | Manual control | |
Control system | RF power supply | Max 300W (0~300W Variable) |
Pirani vacuum gauge | G-TRAN | |
Ionization vacuum gauge | Option | |
Setup | Extreial dimensions | 764mm(W)×723mm(D)×1648mm(H) |
Weight | 260kg |
Utility
Model | RFS-201 |
Power required | 200V Single phase 50/60Hz 2.8kVA |
Ground terminal | A grade (ground resistance/10Ω or less) |
Water requirement | 5.0 L/min (Water temperature : less than 25 degrees C, Water pressure : 200 ? 300kPa (gauge pressure)) |
Connection (power supply) | Vinyl cabtyre cable (with R2-5 ring tongue terminals) 4m |
Connection (ground) | Earth cable (sheet copper) 4m |
Connection (water piping) | Tetoron Braided hose (O.D.dia.15mm × I.D.dia.9mm) 4m (2 lines) |
Dimension drawing

Feedthrough Collar
Basic composition
[1] | Chamber |
[2] | Taeret electrode |
[3] | Substrate electrode |
[4] | Shutter |
[5] | Current guide terminal |
[6] | Thermocouple introduction terminal |
[7] | Gauge port |
[8] | Sample holder |
[9] | Backing plate |
[10] | Target |
[11] | Service port |
[12] | Front door |
Sample holder drawing
[The standard type]

※We customize according to the purpose of research and development.
Optional parts
●Liquid Nitrogen trap | ●Ionization vacuum gauge |
●Magnetron | ●In line trap (OMI-100) |
●Turbo molecular pump | ●DC power supply |
●Introduction gas (2,3 lines) | ●Automatic leak valve for oil rotary pump |