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RF Power Supply Option
PHS-N Series
PHS-04N
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This system is designed to adjust the phase of the power supply for plasma generation such as RF sputtering, plasma CVD, and etching.
This system can change the phase of the output of each power supply to multiple RF power supplies which operate at 13.56 MHz arbitrarily.
Features
- Able to control the phase of multiple RF power supplies.
- Phase shift function adjusts the difference between the cathodes to provide a stable process with little variation.
Specifications
| Model | PHS-04N | PHS-08N | |
| Input specifications | Input voltage | Single phase AC90～240V | |
| Input capacity | 70VA | ||
| Output specifications | Output channels | 4 | 8 |
| Oscillation frequency | 13.56MHz±0.05% | ||
| Phase setting range | 0～360° | ||
| External dimensions W×D×H | 480×192×49mm (Excluding protrusions) | ||
