EB Source for Metal Film

EGL Series

EGL-110

アルバック

EGL-110 electron beam evaporation source is designed to improve performance and reliability based on ULVAC's many years of technical experience and achievements.
This evaporation source has a hearth with a maximum input power of 16kW.
The crucible has a large capacity of 110 cc, which enables the high-speed deposition of thick films.

Features

  • Large-capacity vapor deposition is possible by adopting a large capacity 110cc hearth.
  • The electron beam is deflected by the electromagnetic field, the effect of secondary electrons on the deposition target is extremely small.
  • By scanning the beam spot in the X-axis and Y-axis directions even with a sublimable substance, the partial digging phenomenon can be eliminated and the entire crucible can be evaporated smoothly. (Japan patent 831485, 843447)
  • The electron beam is deflected 270°, so it is not exposed to the above from the vaporized material and the filament has a long life.
  • Since the emitter assembly can be easily attached and detached, it is easy to replace the filament, insulator, etc.

Specifications

Acceleration voltage -4kV~-10kV
Beam current 1.6Amax (at-10kV)
Maximum input 16kW (-10kV, 1.6A)
X-axis deflection coil 0.4~3.5A -18VDCmax
2.8Ω(20℃)
Y-axis deflection coil 0~±1.2A ±12VDCmax
0.9Ω(20℃)2 pcs
Filament 0~6VAC 40Amax
Crucible Volume 110cc
Size 75Φ×59Φ×32H
Beam deflection angle 270°
Effective evaporation angle 120° or more
Deposition rate Al at 16kW 4.5μm/min or more (At 250H directly above Hearth)
Cooling water amount 19L/min or more, 0.7MPa(maximum pressure)
Water temperature 15℃~25℃
External dimensions 136W×90H×220D
Weight About 15kg
Applicable power supply HPS-1000N, HPS-1600F
Remarks 1. Able to attached wire feeder.
2. Cooling water with a specific resistance of 5 kΩ?cm or higher is recommended.

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