EGL-110

ULVAC

EGL-110 electron beam evaporation source is designed to improve performance and reliability based on ULVAC's many years of technical experience and achievements.
This evaporation source has a hearth with a maximum input power of 16kW.
The crucible has a large capacity of 110 cc, which enables the high-speed deposition of thick films.

Features

Large-capacity vapor deposition is possible by adopting a large capacity 110cc hearth.
The electron beam is deflected by the electromagnetic field, the effect of secondary electrons on the deposition target is extremely small.
By scanning the beam spot in the X-axis and Y-axis directions even with a sublimable substance, the partial digging phenomenon can be eliminated and the entire crucible can be evaporated smoothly. (Japan patent 831485, 843447)
The electron beam is deflected 270°, so it is not exposed to the above from the vaporized material and the filament has a long life.
Since the emitter assembly can be easily attached and detached, it is easy to replace the filament, insulator, etc.

Specifications

Acceleration voltage		-4kV～-10kV
Beam current		1.6Amax (at-10kV)
Maximum input		16kW (-10kV, 1.6A)
X-axis deflection coil		0.4～3.5A -18VDCmax 2.8Ω（20℃）
Y-axis deflection coil		0～±1.2A ±12VDCmax 0.9Ω（20℃）2 pcs
Filament		0～6VAC 40Amax
Crucible	Volume	110cc
	Size	75Φ×59Φ×32H
Beam deflection angle		270°
Effective evaporation angle		120° or more
Deposition rate	Al at 16kW	4.5μm/min or more (At 250H directly above Hearth)
Cooling water amount		19L/min or more, 0.7MPa（maximum pressure）
Water temperature		15℃～25℃
External dimensions		136W×90H×220D
Weight		About 15kg
Applicable power supply		HPS-1000N, HPS-1600F
Remarks		1. Able to attached wire feeder. 2. Cooling water with a specific resistance of 5 kΩ?cm or higher is recommended.

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Features

Large-capacity vapor deposition is possible by adopting a large capacity 110cc hearth.

The electron beam is deflected by the electromagnetic field, the effect of secondary electrons on the deposition target is extremely small.

By scanning the beam spot in the X-axis and Y-axis directions even with a sublimable substance, the partial digging phenomenon can be eliminated and the entire crucible can be evaporated smoothly. (Japan patent 831485, 843447)

The electron beam is deflected 270°, so it is not exposed to the above from the vaporized material and the filament has a long life.

Since the emitter assembly can be easily attached and detached, it is easy to replace the filament, insulator, etc.

Specifications

Acceleration voltage		-4kV～-10kV
Beam current		1.6Amax (at-10kV)
Maximum input		16kW (-10kV, 1.6A)
X-axis deflection coil		0.4～3.5A -18VDCmax 2.8Ω（20℃）
Y-axis deflection coil		0～±1.2A ±12VDCmax 0.9Ω（20℃）2 pcs
Filament		0～6VAC 40Amax
Crucible	Volume	110cc
	Size	75Φ×59Φ×32H
Beam deflection angle		270°
Effective evaporation angle		120° or more
Deposition rate	Al at 16kW	4.5μm/min or more (At 250H directly above Hearth)
Cooling water amount		19L/min or more, 0.7MPa（maximum pressure）
Water temperature		15℃～25℃
External dimensions		136W×90H×220D
Weight		About 15kg
Applicable power supply		HPS-1000N, HPS-1600F
Remarks		1. Able to attached wire feeder. 2. Cooling water with a specific resistance of 5 kΩ?cm or higher is recommended.