EGL-35

ULVAC

Electron beam evaporation source EGL-35 is designed to improve performance and reliability based on ULVAC's many years of technical experience and achievements.
This evaporation source has a hearth with a maximum input power of 10 kW.
The crucible has a large capacity of 40 cc per piece, which enables the high-speed deposition of thick films.

Features

Large-capacity vapor deposition is possible by using a large-capacity 40cc hearth.
The electron beam is deflected by the electromagnetic field, the effect of secondary electrons on the deposition target is extremely small.
By scanning the beam spot in the X-axis and Y-axis directions even with a sublimable substance, the partial digging phenomenon can be eliminated and the entire crucible can be evaporated smoothly.（Japan patents 831485, 843447)
The electron beam is deflected 270°, so it is not exposed to the above from the vaporized material and the filament has a long life.
Since the emitter assembly can be easily attached and detached, it is easy to replace the filament, insulator, etc.

Specifications

Acceleration voltage		-4kV～-10kV DC
Beam current		MAX 1.0A (At accelerating voltage-10kV)
Maximum input power		10kW（-10kV, 1.0A）
X-axis deflection coil		0.4～3.5A MAX-18V DC 2.8Ω (At room temperature 20°C)
Y-axis deflection coil		0～±2A MAX±12VDCmax 6Ω×2 (At room temperature 20°C)
Filament		0～6V AC MAX40A
Crucible	Volume	40cc
	Size	50Φ×41Φ×25H
Beam deflection angle		270°
Effective evaporation angle		120° or more
Deposition rate		1.8μm/min or more（A110kW, 250H directly above the hearth）
Cooling water volume		10L/min or more（Maximum output 0.7MPa）
Water temperature		15～25℃
External dimensions		110H×79W×206D
Weight		10kg
Applicable power supply		HP-1000N, HPS-1600F
Remarks		1. Wire feeder mountable 2. Cooling water with a specific resistance of 5 kΩ?cm or higher is recommended

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Features

Large-capacity vapor deposition is possible by using a large-capacity 40cc hearth.

The electron beam is deflected by the electromagnetic field, the effect of secondary electrons on the deposition target is extremely small.

By scanning the beam spot in the X-axis and Y-axis directions even with a sublimable substance, the partial digging phenomenon can be eliminated and the entire crucible can be evaporated smoothly.（Japan patents 831485, 843447)

The electron beam is deflected 270°, so it is not exposed to the above from the vaporized material and the filament has a long life.

Since the emitter assembly can be easily attached and detached, it is easy to replace the filament, insulator, etc.

Specifications

Acceleration voltage		-4kV～-10kV DC
Beam current		MAX 1.0A (At accelerating voltage-10kV)
Maximum input power		10kW（-10kV, 1.0A）
X-axis deflection coil		0.4～3.5A MAX-18V DC 2.8Ω (At room temperature 20°C)
Y-axis deflection coil		0～±2A MAX±12VDCmax 6Ω×2 (At room temperature 20°C)
Filament		0～6V AC MAX40A
Crucible	Volume	40cc
	Size	50Φ×41Φ×25H
Beam deflection angle		270°
Effective evaporation angle		120° or more
Deposition rate		1.8μm/min or more（A110kW, 250H directly above the hearth）
Cooling water volume		10L/min or more（Maximum output 0.7MPa）
Water temperature		15～25℃
External dimensions		110H×79W×206D
Weight		10kg
Applicable power supply		HP-1000N, HPS-1600F
Remarks		1. Wire feeder mountable 2. Cooling water with a specific resistance of 5 kΩ?cm or higher is recommended