EB Source for Metal Film

EGL Series



Electron beam evaporation source EGL-35 is designed to improve performance and reliability based on ULVAC's many years of technical experience and achievements.
This evaporation source has a hearth with a maximum input power of 10 kW.
The crucible has a large capacity of 40 cc per piece, which enables the high-speed deposition of thick films.


  • Large-capacity vapor deposition is possible by using a large-capacity 40cc hearth.
  • The electron beam is deflected by the electromagnetic field, the effect of secondary electrons on the deposition target is extremely small.
  • By scanning the beam spot in the X-axis and Y-axis directions even with a sublimable substance, the partial digging phenomenon can be eliminated and the entire crucible can be evaporated smoothly.(Japan patents 831485, 843447)
  • The electron beam is deflected 270°, so it is not exposed to the above from the vaporized material and the filament has a long life.
  • Since the emitter assembly can be easily attached and detached, it is easy to replace the filament, insulator, etc.


Acceleration voltage -4kV~-10kV DC
Beam current MAX 1.0A (At accelerating voltage-10kV)
Maximum input power 10kW(-10kV, 1.0A)
X-axis deflection coil 0.4~3.5A MAX-18V DC
2.8Ω (At room temperature 20°C)
Y-axis deflection coil 0~±2A MAX±12VDCmax
6Ω×2 (At room temperature 20°C)
Filament 0~6V AC MAX40A
Crucible Volume 40cc
Size 50Φ×41Φ×25H
Beam deflection angle 270°
Effective evaporation angle 120° or more
Deposition rate 1.8μm/min or more(A110kW, 250H directly above the hearth)
Cooling water volume 10L/min or more(Maximum output 0.7MPa)
Water temperature 15~25℃
External dimensions 110H×79W×206D
Weight 10kg
Applicable power supply HP-1000N, HPS-1600F
Remarks 1. Wire feeder mountable
2. Cooling water with a specific resistance of 5 kΩ?cm or higher is recommended


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