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Nano-particle Deposition System
Arc Plasma Source
APS-1
アルバック販売
Simultaneous deposition of different "targets"
By adding this source to APD series or your vacuum chamber, different "targets" can be deposited simultaneously and materials with new characters can be produced.
By adding this source to APD series or your vacuum chamber, different "targets" can be deposited simultaneously and materials with new characters can be produced.
Features
- Due to size uniformity of nanoparticles compared with ones produced through previous wet process, highly active catalysts can be produced.
- Capable of selecting nanoparticle diameter from approx.1.5nm to 6nm
- Capable of generating easily oxide and nitride by changing atmosphere
- Attachable to a vacuum flange of ICF070 (VG50) or equivalent without any consideration of which direction
- Easy maintenance because no water cooling facilities are needed
Applications
- Produce chemical compounds from multiple depositions
- Add to your vacuum chamber
Specifications
| Target size | Φ 10mm × L 17 mm |
|---|---|
| Substrate size | Φ 2 inch (Φ 50 mm) |
| Deposition rate | 0.01 nm/s ～ 0.3 nm/s *1 |
| Film thickness uniformity | Fe: < ± 10 % (Φ 20 mm area) *1 |
| Materials Available for deposition | Conductive materials *2 |
＊1 Distance from a target to a substrate: 80mm
＊2 Specific resistance of a target: 0.01Ωcm or less
Schematic of the Arc Plasma Source(APS)
Utility
System diagram
1. Condenser box：W110 x D320 x H200 (mm)
2. Body of APS within vacuum chamber：Φ34 x L200 (mm)
3. Power supply unit：W200 x D360 x H200 (mm)
4. Controller：W240 x D400 x H200 (mm)
※Put power supply unit & controller onto the rack.
TEM Images for Nano-Particles prepared by APS
（From left）
- TEM image of Pt nano-particles supported on
Well-dispersed Pt nano-particles on the carbon powder are deposited. - TEM image of Pt nono-particles on a substrate
The size of nano-particle becomes larger as the pulse number of arc plasma shots is increased. - TEM image of Pt thin film
Extremely thin Pt film is formed by a stacking of nano-particles.
Photos of Deposition System installing APS
Example 1 : Sputtering system with APS
Example 2 : Arc Plasma Deposition system with one APS(APD-1P)
Table 1 Elements checked for deposition
| 1A | 2A | 3A | 4A | 5A | 6A | 7A | 8 | 1B | 2B | 3B | 4B | 5B | 6B | 7B | 0 | |||
| 1 | H | He | ||||||||||||||||
| 2 | Li | Be | B | C | N | O | F | Ne | ||||||||||
| 3 | Na | Mg | Al | Si | P | S | Cl | Ar | ||||||||||
| 4 | K | Ca | Sc | Ti | V | Cr | Mn | Fe | Co | Ni | Cu | Zn | Ga | Ge | As | Se | Br | Kr |
| 5 | Rb | Sr | Y | Zr | Nb | Mo | Tc | Ru | Rh | Pd | Ag | Cd | In | Sn | Sb | Te | I | Xe |
| 6 | Cs | Ba | Lanthanoid | Hf | Ta | W | Re | Os | Ir | Pt | Au | Hg | TI | Pb | Bi | Po | At | Rn |
| 7 | Fr | Ra | Actinoid | |||||||||||||||
Checked Limited in use
