Cryo Pump
CRYO-U10HSP
アルバック・クライオ
A wide range of products from small- to large-type are available according to the applications including FPD, semiconductors, electronic equipment, optics, and R&D.
Features
- Optimal for sputtering applications
- Argon capacity is 2 times of existing model (U10H).
- Extended intervals between regenerations means higher tool availability.
- Multiple connections (up to 3) can be made.
Specification
Pumping speeds(20℃) | Nitrogen | L/s | 2,400 |
Hydrogen | 3,600 | ||
Argon | 2,000 | ||
Water | 6,900 | ||
Ultimate pressure | Pa(Torr) | 10-7(10-9) | |
Maximum flow rate | Argon | Pa・L/s(Torr・L/s) | 1.30×103(9.8) |
Pumping speed | Argon | Pa・L(Torr・L) | 2.0×108(1.5×106) |
1.2×106(9.0×103) | |||
Cooldown time (Power cycles) |
min(Hz) | 120/110(50/60) | |
Mounting flange | UVG-250,10BANSI | ||
compressor unit | C15T | ||
Weight | Kg | 36.0 |
*Maintenance interval:16,000 hours
*Moveable base is option
Dimensions (mm)
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Accessories and Consumables
Instruction Manuals and Specifications Download
Applications Download
Technical drawings Download
Technical Data Download
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CRYOPUMP - Usage instructions
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Cryopump - Safety Instructions
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Cryopump - Trouble shooting
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