Cryo Pump
CRYO-U16
アルバック・クライオ
A wide range of products from small- to large-type are available according to the applications including FPD, semiconductors, electronic equipment, optics, and R&D.
Features
- Suitable for medium and large-size equipments.
- Suitable for batch type large deposition systems.
- Resistant to thermal load.
Specification
Pumping sppeds(20℃) | Nitrogen | L/s | 5,000 |
Hydrogen | 10,000 | ||
Argon | 4,200 | ||
Water | 16,000 | ||
Ultimate pressure | Pa(Torr) | 10-7(10-9) | |
Maximum flow rate | Argon | Pa・L/s(Torr・L/s) | 1.4×103(11.0) |
Pumping capacity | Argon | Pa・L(Torr・L) | 4.3×108(3.3×106) |
Hydrogen | 2.4×106(1.8×104) | ||
Cooldown time (Power cycle) |
min(Hz) | 110/100(50/60) | |
Mounting flange | UVG-400 | ||
Compressor unit | C30VRT | ||
Weight | Kg | 61.0 |
*Maintenance interval:16,000 hours
*Moveable base is option
Dimension (Unit:mm)
該非判定結果報告書 Download
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Accessories and Consumables
Instruction Manuals and Specifications Download
Applications Download
Technical drawings Download
Technical Data Download
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Cryopumps
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Vacuum gauge - Selection guide
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CRYOPUMP - Usage instructions
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Cryopump - Safety Instructions
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Cryopump - Trouble shooting
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