Cryo Pump
CRYO-U8HSP
アルバック・クライオ
A wide range of products from small- to large-type are available according to the applications including FPD, semiconductors, electronic equipment, optics, and R&D.
Features
- Suitable for sputtering process.
- The displacement of argon is about 2.5 times that of the conventional model (U8H).
- The hydrogen exhaust rate has improved to about 1.2 times that of the conventional model (U8H).
- The interval to playback becomes longer, contributing to the improvement of equipment availability.
- Multiple operation (up to 3 units)
Specification
Pumping speeds(20℃) | Nitrogen | L/s | 1,700 |
Hydrogen | 3,200 | ||
Argon | 1,400 | ||
Water | 4,000 | ||
Ultimate pressure | Pa(Torr) | 10-7(10-9) | |
Maximum flow rate | Argon | Pa・L/s(Torr・L/s) | 1.2×103(8.9) |
Pumping capacity | Argon | Pa・L(Torr・L) | 2.5×108(1.9×106) |
Hydrogen | 1.0×106(7.8×103) | ||
Cooldown time (Power cycle) |
min(Hz) | 125/115(50/60) | |
Mounting flange | UVG-200,6BANSI,UFC-253 | ||
Compressor unit | C10T,C10AT | ||
Kg | 33.2 |
*Maintenance interval:16,000 hours
Dimenssions (Unit:mm)
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Accessories and Consumables
Instruction Manuals and Specifications Download
Applications Download
Technical drawings Download
Technical Data Download
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