Technology
Applications of Process gas monitor.
（1）Application Data Deposition Equipment Residual Gas Data.
Atmospheric pressure components. N2：78％ O2：21％ Ar：0.9％
・The normal high vacuum state has mainly H2O and H2.
・The existence of leak can be judged by the ionic strength of N2(28) and O2(32) and their ratios.
・Contamination of oil components can be judged by M/e=39,41,43,55,57（CｘHｙ）.
（2）Application Data PVD Process Gas Data（Semi）
（3）Application Data PVD Process Gas Data （FPD）
At the time of Ar Gas introduction (2）.（When introducing Ar 400 sccm, O2 is introduced 2 → 4 → 6 → 8 → 10sccm.）
（4）Application Data PVD Process Gas Data （semi）
（5）Application Data Vacuum Drying Furnace ・Process Data
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